New features added in order to improve accuracy and usabilitySK hynix expands adoption of Gauss Labs's solution to etching process in addition to thin film deposition processGauss Labs plans to expand its presence in global industrial AI market with strong references in semiconductor manufacturingSEOUL, South Korea, Aug. 12, 2024 /PRNewswire/ -- Gauss Labs announced today that it released the second version of its AI-based virtual metrology* solution, Panoptes VM 2.0.*Metrology: a process of measuring the physical and electrical characteristics to ensure that requirements are met in the manufacturing processGauss Labs Releases AI-Based Virtual Metrology Solution, Panoptes VM 2.0Panoptes VM provides all-wafer measurement data in real-time by predicting process outcomes from sensor data. By applying this solution, it is possible to predict the process results of all products without physical full-scale measurement, significantly reducing time and resources.Gauss Labs said that Panoptes VM 2.0 is making a new leap forward with new modeling features including the Multi-Step Modeling, Operation-Group Modeling and Automatic Model Selection. With these new features, the prediction accuracy and usability have been greatly improved, compared to the previous version.Gauss Labs, an industrial AI company invested by SK hynix, first launched Panoptes VM 1.0 in November 2022. The system has been deployed to the thin film deposition* process at SK hynix's high-volume manufacturing fabs since December 2022. By integrating the virtual measurement results from Panoptes VM with APC*, SK hynix improved process variability* by approximately 29% and also enhanced yield rate.*Thin film deposition: the process of creating and depositing thin film coatings onto a substrate material*APC(Advanced Process Control): a solution that adjusts process condition for equipment adaptively during a manufacturing process*Variability: the scale of the quality variation of the products from a certain process

-  Two joint academic papers on AI-based metrology technology presented-  Gauss Labs's innovative technology improves process control and equipment productivity in semiconductor manufacturing-  Gauss Labs is at the forefront, leading industrial AI efforts to transform the manufacturing industrySEOUL, South Korea, Feb. 29, 2024 /PRNewswire/ -- SK hynix Inc. (or "the company", www.skhynix.com) and Gauss Labs announced today that they participated in the SPIE AL* 2024, an international conference held in San Jose, California, and presented two papers based on the latest technology for AI-based metrology. Gauss Labs CEO Mike Kim (center) poses with his colleagues. * SPIE Advanced Lithography + Patterning (SPIE AL): a conference hosted by the Society of Photo-Optical Instrumentation Engineers (SPIE), the most prestigious international society in optics and photonics following foundation in 1955, where overall lithography technology for drawing semiconductor circuits is discussed