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IMS Nanofabrication
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Multibeam mask writers for semiconductor lithography
IMS Nanofabrication
Work Here?
Multibeam mask writers for semiconductor lithography
Overview
IMS Nanofabrication designs and sells multi-beam mask writers used in semiconductor lithography. These machines use several precise beams to expose masks that define microchip patterns, supporting customers with installation, service, and ongoing support. The company differentiates itself through deep mechatronics expertise and custom engineering, delivering highly precise, reliable equipment for leading semiconductor manufacturers and research institutions worldwide. Its goal is to provide reliable lithography tools that enable the production of next-generation microchips and to be a trusted partner in the semiconductor industry.
About IMS Nanofabrication
Industries
Robotics & Automation
Hardware
Industrial & Manufacturing
Company Size
201-500
Company Stage
Private
Total Funding
N/A
Headquarters
Brunn am Gebirge, Austria
Founded
1985
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Simplify's Take
What believers are saying
- SPIE 2026 says MBMW-401 delivers 3.5 µA and sub-20 nm production resolution.
- IMS presented EUV mask advances for 14A and beyond at Photomask 2026.
- Market reports still rank IMS as the leading multi-beam mask-writer supplier.
What critics are saying
- Revelio Labs reports headcount fell 19.9% in 2026 after 2025 reductions.
- IMS remains dependent on one extreme niche; NuFlare can attack pricing and account control.
- Any MBMW-401 yield failure at Intel or TSMC would damage ordering for years.
What makes IMS Nanofabrication unique
- IMS’s MBMW-401 writes 590,000 beams, enabling 14A and beyond masks in 2026.
- Its customers include Intel, TSMC, Samsung, SK hynix, and Micron.
- Multi-beam write time stays largely independent of pattern complexity, unlike VSB systems.
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Funding
Total Funding
$0
Below
Industry Average
Funded Over
3 Rounds
Benefits
Health Insurance
Flexible Work Hours
Remote Work Options
Paid Vacation
Paid Sick Leave
Meal Benefits
Commuter Benefits
Company Social Events
Employee Discounts
Performance Bonus
Wellness Program
Mental Health Support
Company News
In 2010, IMS developed the first proof of concept Multi-Beam Mask Writer (MBMW). The mask writer was assembled in Vienna in 2011 and included a CMOS-addressable unit for providing 262,144 programmable electron beams on 6-inch photomasks. This would lay the foundation for a consortium with Intel, TSMC, DNP and Photronics.
TSMC has collaborated with IMS Nano since 2012, and this investment is expected to deepen their partnership.
NuFlare Technology, competing with an alliance between JEOL and Ims, provides electron beam devices for photomask tracing.
IMS Nanofabrication AG (www.ims.co.at) announced that it has closed an equity funding round with participation from Intel Capital, Photronics Inc. and
Following the takeover, IMS quadrupled its employee base and manufacturing capabilities and also released three generations of e-beam mask writing products.
IMS Nanofabrication is Hiring for 3 Jobs on Simplify!
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About IMS Nanofabrication
Industries
Robotics & Automation
Hardware
Industrial & Manufacturing
Company Size
201-500
Company Stage
Private
Total Funding
N/A
Headquarters
Brunn am Gebirge, Austria
Founded
1985
IMS Nanofabrication is Hiring for 3 Jobs on Simplify!
Find jobs on Simplify and start your career today