Physics – Engineering Intern: Multi-beam SEM performance optimization
ASML
Physics – Engineering Intern: Multi-beam SEM performance optimization
ASML
Manufactures photolithography systems for semiconductors
At ASML Delft, we are developing a next-generation multi-beam scanning electron microscope (SEM) for semiconductor wafer inspection. This internship focuses on improving the imaging performance of advanced inspection systems used in semiconductor manufacturing. Due to the microscope's large field of view and shallow depth of focus, wafer surface variations can affect image quality and inspection efficiency. During this internship, you will help develop methods to better understand these effects and improve system performance. This internship offers the opportunity to combine physics, data analysis, and engineering in a highly innovative environment.
As an intern, you will contribute to the optimization of multi-beam SEM performance through calibration measurements, data analysis, and performance evaluation. You will work closely with specialists from different engineering disciplines to gain insight into electron-optical system behavior and identify opportunities for improvement. Your work will support the development of more robust inspection strategies and improved imaging performance.
Your main responsibilities will be:
This is a master's non-thesis internship for minimum 5 months, minimum 5 days per week (2 days on-site). The start date of this internship is as of February/March 2027.
To be suitable for the internship, you:
This internship is ideal for students who enjoy combining theory, experiments, and data analysis to solve technical challenges. Through this internship, you will contribute directly to the development of advanced inspection technology and gain valuable experience within a leading high-tech company.
Other requirements you need to meet:
This position requires access to controlled technology, as defined in the United States Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.
ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that inclusion and diversity is a driving force in the success of our company.
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ASML makes photolithography systems for semiconductor manufacturing, focusing on deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography machines that print circuits on silicon wafers. EUV enables finer features than DUV by using shorter-wavelength light. The company earns revenue from selling the machines and from installation, maintenance, and upgrades, and it differentiates itself by its dominant position in high-end lithography and a global services network serving major chipmakers like TSMC, Samsung, and Intel.
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