Physics: Engineering Internship
ASML
Physics: Engineering Internship
ASML
Manufactures photolithography systems for semiconductors
At ASML’s Delft office, you will join a team developing a multi-beam electron microscope used to inspect semiconductor wafers during production. A key part of this system is a micro-electromechanical (MEMS) module that shapes and directs electron beams. Small manufacturing variations in this module can influence electron optics performance, including beam focus and alignment. Understanding these effects is essential for designing reliable and robust products. During the internship, you will help generate insights that support future technology development and improve system performance.
During the internship, you will work closely with experienced engineers and researchers to investigate the impact of manufacturing tolerances on a MEMS module used in advanced electron microscopy. You will use simulations and data analysis to understand how geometrical imperfections affect electron beam behavior and identify the most critical design sensitivities. Your findings will support design decisions and contribute to the development of next-generation inspection technology.
Your main responsibilities will be:
Adapt and parameterize existing simulation models to represent manufacturing variations in MEMS structures.
Analyze the impact of geometrical deviations on electron beam focus and alignment.
Evaluate how different manufacturing tolerances interact and influence overall system performance.
Identify the most critical deviations and quantify their effect on electron optics behavior.
Use simulation results to support the interpretation of data from prototype scanning electron microscope systems.
Document findings and communicate recommendations to the design team.
Collaborate with engineers and researchers to improve understanding of performance sensitivities.
This is a master’s non-thesis internship for minimum 5 months, 5 days per week (2 days on-site). The start date of this internship is as of February/March 2027.
To be suitable for the internship, you:
During the internship, you will contribute to innovative semiconductor technology while developing advanced simulation and analytical skills. You will gain hands-on experience within a multidisciplinary environment and work alongside experts solving complex engineering challenges. The internship provides meaningful exposure to cutting-edge technology development and the opportunity to make a tangible contribution to ASML’s future products.
Other requirements you need to meet
This position requires access to controlled technology, as defined in the United States Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.
ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that inclusion and diversity is a driving force in the success of our company.
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ASML makes photolithography systems for semiconductor manufacturing, focusing on deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography machines that print circuits on silicon wafers. EUV enables finer features than DUV by using shorter-wavelength light. The company earns revenue from selling the machines and from installation, maintenance, and upgrades, and it differentiates itself by its dominant position in high-end lithography and a global services network serving major chipmakers like TSMC, Samsung, and Intel.
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