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IMS Nanofabrication

Multibeam mask writers for semiconductor lithography

Field Service Engineer 2

Full-TimeUpdated on 10/23/2026
No salary listed
Mid, Senior
Bachelor's
Hillsboro, OR, USA
In PersonIn-person in Hillsboro, with daily presence at customer sites.
Field ServiceEquipment Field Service

About the job

Requirements
  • A Bachelor of Science degree in an Engineering discipline is required.
  • Two to five or more years of Field Service experience are required.
  • At least three years of customer-facing experience are required; five years are preferred.
  • Good written and verbal communication skills are required.
  • Good problem-solving skills are required.
  • Excellent interpersonal skills and ability to integrate with a global team are required.
  • A prior metrology or lithography equipment support background is required.
  • Troubleshooting experience with ultra-high vacuum systems is required.
  • Experience in Linux/UNIX server system administration is required.
Responsibilities
  • Perform activities related to the installation, annual preventive maintenance, and issue resolution of Multi-beam mask writers.
  • Follow IMS-defined methodologies and procedures uniformly, and provide feedback to Headquarters regarding improvements, gaps, or necessary changes.
  • Participate in task force teams handling customer escalations and challenging incidents, including regular communication with the customer and headquarters functions.
  • Communicate status updates to IMS U.S. leadership.
  • Maintain and build relationships with local Tool Owners and other critical customer stakeholders.
  • Attend fab-related customer meetings to update the team on ongoing and planned issue resolution, installation, and annual preventive maintenance activities.
  • Maintain an in-person presence in Hillsboro, Oregon, and at customer sites daily.
Desired Qualifications
  • Five years of customer-facing experience are preferred.

About the company

IMS Nanofabrication designs and sells multi-beam mask writers used in semiconductor lithography. These machines use several precise beams to expose masks that define microchip patterns, supporting customers with installation, service, and ongoing support. The company differentiates itself through deep mechatronics expertise and custom engineering, delivering highly precise, reliable equipment for leading semiconductor manufacturers and research institutions worldwide. Its goal is to provide reliable lithography tools that enable the production of next-generation microchips and to be a trusted partner in the semiconductor industry.

Company Size

201-500

Company Stage

Private

Total Funding

N/A

Headquarters

Brunn am Gebirge, Austria

Founded

1985

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Simplify's Take

What believers are saying

  • SPIE 2026 says MBMW-401 delivers 3.5 µA and sub-20 nm production resolution.
  • IMS presented EUV mask advances for 14A and beyond at Photomask 2026.
  • Market reports still rank IMS as the leading multi-beam mask-writer supplier.

What critics are saying

  • Revelio Labs reports headcount fell 19.9% in 2026 after 2025 reductions.
  • IMS remains dependent on one extreme niche; NuFlare can attack pricing and account control.
  • Any MBMW-401 yield failure at Intel or TSMC would damage ordering for years.

What makes IMS Nanofabrication unique

  • IMS’s MBMW-401 writes 590,000 beams, enabling 14A and beyond masks in 2026.
  • Its customers include Intel, TSMC, Samsung, SK hynix, and Micron.
  • Multi-beam write time stays largely independent of pattern complexity, unlike VSB systems.

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Benefits

  • Health Insurance
  • Flexible Work Hours
  • Remote Work Options
  • Paid Vacation
  • Paid Sick Leave
  • Meal Benefits
  • Commuter Benefits
  • Company Social Events
  • Employee Discounts
  • Performance Bonus
  • Wellness Program
  • Mental Health Support

Company News

IMS Nanofabrication GmbH
Sep 24th, 2026
History - IMS Nanofabrication GmbH

In 2010, IMS developed the first proof of concept Multi-Beam Mask Writer (MBMW). The mask writer was assembled in Vienna in 2011 and included a CMOS-addressable unit for providing 262,144 programmable electron beams on 6-inch photomasks. This would lay the foundation for a consortium with Intel, TSMC, DNP and Photronics.

6d Online
Sep 12th, 2023
TSMC Buys 10% Stake in IMS Nano from Intel

TSMC has collaborated with IMS Nano since 2012, and this investment is expected to deepen their partnership.

TS2 SPACE
Jul 24th, 2023
Japan Adds Advanced Semiconductor-Manufacturing Equipment to Export Control List

NuFlare Technology, competing with an alliance between JEOL and Ims, provides electron beam devices for photomask tracing.

Business Wire
Jun 28th, 2023
IMS Nanofabrication Announces Equity Funding Round with Intel Capital and Photronics

IMS Nanofabrication AG (www.ims.co.at) announced that it has closed an equity funding round with participation from Intel Capital, Photronics Inc. and

AnandTech
Jun 22nd, 2023
Intel Sells a 20% Stake in Maker of Multi E-Beam Mask Writing Tools

Following the takeover, IMS quadrupled its employee base and manufacturing capabilities and also released three generations of e-beam mask writing products.